| 引用本文: | 王浩宇,任志英,陈书赢,郭伟玲,马国政,赵海朝.月尘微观吸附机理及其防护技术研究现状[J].中国表面工程,2024,37(4):1~17 |
| WANG Haoyu,REN Zhiying,CHEN Shuying,GUO Weiling,MA Guozheng,ZHAO Haichao.Research Status of Microscopic Adsorption Mechanism and Protection Technology of Lunar Dust[J].China Surface Engineering,2024,37(4):1~17 |
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| 摘要: |
| 月尘防护是未来月面探索中面临的重要难题之一，不同防护效果将对航天器性能产生重要影响，深入开展月尘颗粒在航天器表面的微观吸附行为及其防护技术的研究至关重要。主要从月尘颗粒吸附机理、吸附力测试技术及月尘防护的方法展开综述与展望。首先说明月尘颗粒的物理、化学性质及吸附机理，重点聚焦建立月尘颗粒与基体表面的吸附力解析模型，包括范德华力、静电力、毛细力；其次，利用原子力技术测量月尘颗粒吸附力参数。分析对比目前针对微纳米颗粒吸附问题的主动与被动防护技术。对月尘吸附力测试与月尘防护技术发展等问题的发展趋势进行展望。通过原子力技术开展月尘颗粒吸附力，解决现有其余测试技术产生的弊端，对推进月尘颗粒吸附机理及防护技术的研究具有重要意义。 |
| 关键词: 月尘 原子力显微镜 吸附机理 月尘防护技术 月尘模拟物 |
| DOI：10.11933/j.issn.1007-9289.20230726002 |
| 分类号:TB33；TB39 |
| 基金项目:国家自然科学基金（52205225，52105236）；北京市自然科学基金（3232016） |
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| Research Status of Microscopic Adsorption Mechanism and Protection Technology of Lunar Dust |
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WANG Haoyu1，REN Zhiying1，CHEN Shuying2，GUO Weiling3，MA Guozheng3，ZHAO Haichao4
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1.College of Mechanical Engineering and Automation, Fuzhou University,Fuzhou 350116 , China ；2.National Key Laboratory of Human Factors Engineering, China Astronaut Research and Training Center,Beijing 100094 , China ；3.National Key Laboratory for Remanufacturing, Army Academy of Armored Forces,Beijing 100072 , China ；4.National Engineering Research Center for Remanufacturing, Army Academy of Armored Forces,Beijing 100072 , China
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| Abstract: |
| Lunar-dust protection is important for future lunar surface exploration. Lunar dust comprises extremely fine particles on the Moon’s surface. The surface shape is irregular, and the average diameter is 40-130 μm. It is primarily composed of amorphous glass, plagioclase, and other components, and contains almost all trace elements. The unique physical and chemical properties of lunar dust enable it to be easily adsorbed onto the surface of detectors and spacesuits, thereby resulting in equipment failure. Therefore, the micro-adsorption behavior of lunar-dust particles on the surface of spacecraft and their protection technology must be investigated. This paper summarizes and discusses the micro-adsorption mechanism of lunar-dust particles, the measurement technology for the adsorption force, and protection methods for lunar dust. First, combining the physical and chemical properties of lunar-dust particles, the causes of dusting and the adsorption behavior on the Moon’s surface are analyzed. Furthermore, an analytical model of the adsorption force between lunar-dust particles and the surface of the probe substrate is established, including van der Waals, electrostatic, and capillary forces. However, unlike the force generated by water molecules in the ground environment, the adsorption force between lunar-dust particles and the sample surface in an ultrahigh vacuum environment is primarily composed of van der Waals and electrostatic forces, and the capillary force need not be considered necessarily. In addition, van der Waals forces dominates short-range actions, whereas electrostatic forces dominates long-range actions. Based on this model, the proportions and factors affecting each component of the adsorption force are calculated. Second, adsorption-test technology is categorized into contact and non-contact technologies. A comparison between atomic-force testing technology as a contact technology and other schemes show that the interference factors are relatively few when the former is applied to measure the adsorption force of lunar-dust particles. Its measurement accuracy can reach the nanometer level, and the single-point microscopic adsorption characteristics of lunar-dust particles can be dynamically observed, thus enabling one to achieve the goals of high precision and accuracy more easily. Subsequently, the basic principle and method of directly reflecting the interaction between the probe and sample surface using the deformation value of the probe cantilever beam are introduced. Additionally, active and passive protection technologies of van der Waals forces, electrostatic forces, and mechanical dust control for the adsorption of micro-nano particles are systematically summarized, and the advantages and disadvantages of various dust-removal technologies are analyzed. Passive protection technology presents fewer influencing factors and higher stability, thus rendering it more suitable for various application environments. Finally, the development trends of lunar-dust adsorption tests and lunar-dust protection technology are highlighted. Notably, high-vacuum atomic-force-microscope equipment, which feature a low permeability, should be popularized. Currently, macroscopic adsorption experiments pertaining to the dispersion of lunar dust are few, and simulations of lunar dust should be further optimized and developed. In this study, the adsorption mechanism and adsorption model of lunar-dust particles under micro-conditions are established, and the applicability, advantages, and disadvantages of atomic testing technology are discussed based on the adsorption test of lunar-dust particles. The test process steps are described comprehensively. This scheme overcomes the shortcomings of other testing technologies and is crucial for promoting research pertaining to the adsorption mechanisms and protection technologies of lunar-dust particles. Additionally, it serves as a foundation for the subsequent screening of lunar-dust friction and wear-test materials. |
| Key words: lunar dust atomic force microscope adhesion mechanism lunar-dust protection technology lunar-dust simulant |
