引用本文:褚莹洁,仇猛淋,胥密,郑力,王广甫,殷鹏.低能氢负离子激发石英玻璃发光[J].中国表面工程,2017,30(4):14~18
CHU Ying-jie,QIU Meng-lin,XU Mi,ZHENG Li,WANG Guang-fu,YIN Peng.Negative Hydrogen Ions Induced Luminescence from Silica Glass[J].China Surface Engineering,2017,30(4):14~18
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低能氢负离子激发石英玻璃发光
褚莹洁1, 仇猛淋1, 胥密1, 郑力1, 王广甫1,2, 殷鹏1
1.北京师范大学 核科学与技术学院, 北京 100875;2.北京市辐射中心, 北京 100875
摘要:
为研究材料辐照损伤的产生机制和缺陷的实时演变过程，在GIC4117串列加速器原有的低能负离子注入平台基础上加装光谱测量系统，实现具有“charge-up free”优点的负离子激发发光在线测量。利用20 keV H-轰击羟基含量为20 μg/g，1 100 μg/g的石英玻璃测量其发射光谱，研究离子束辐照前后样品的吸收光谱。离子轰击过程中，发光中心数目随剂量先增加后缓慢衰减至平衡状态；蓝色和红色波段发光峰发光产额比可能受表面结构的影响稳定在3~4之间，低于MeV H+激发产额比。辐照前后吸收光谱反映的缺陷浓度变化与离子激发石英玻璃光谱强度变化一致。羟基含量较高的石英玻璃，发射光谱强度较低，吸收光谱强度辐照前后相对变化较小，对应产生的弗伦克尔缺陷数目较少。
关键词:  负离子  石英玻璃  发光  羟基  缺陷
DOI：10.11933/j.issn.1007-9289.20170226003
分类号:O482.3
基金项目:北京市自然科学基金（1142006）
Negative Hydrogen Ions Induced Luminescence from Silica Glass
CHU Ying-jie1, QIU Meng-lin1, XU Mi1, ZHENG Li1, WANG Guang-fu1,2, YIN Peng1
1.College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875;2.Beijing Radiation Center, Beijing 100875
Abstract:
A new in-situ luminescence measurements set-up was recently developed at the injector of the GIC4117 Tandem accelerator based on the original ion implantation system, to study the radiation damage mechanism and defects evolution of materials during irradiation. The new set-up can perform the negative-ion induced luminescence measurements with the advantage of "charge-up free". Irradiations were carried out by 20 keV H- on silica glasses with silanol group content of 20 μg/g and 1 100 μg/g. After irradiation, a comparative analysis of optical absorption spectra from samples had been performed. The corresponding luminescent centers increase with ion fluence initially,following a gradual decrease and then reach a roughly steady value during irradiation. Due to the surface effects, the area ratio between of blue and red bands is between 3 and 4, much lower than that under H+ irradiation at MeV. Ultraviolet-visible absorption spectra of virgin and irradiated samples reveal that the concentration of defects is in agreement with ion beam induced luminescence intensity. The silica glass with high silanol group content shows lower emission band intensity and the smaller absorption spectra increase indicating the corresponding lower Frenkel defects concentration.
Key words:  negative ions  silica glass  luminescence  silanol group  defects
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