电沉积技术制备纳米SiO2/Ni复合镀层工艺的研究

成旦红; 桑付明; 袁蓉; 曹铁华; 徐伟一

引用本文:	成旦红,桑付明,袁蓉,曹铁华,徐伟一.电沉积技术制备纳米SiO2/Ni复合镀层工艺的研究[J].中国表面工程,2003,(6):31~34,41
	.Study on the Preparation Technology of Electrodeposited Ni/Nano SiO2-Composite Coatings[J].China Surface Engineering,2003,(6):31~34,41

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电沉积技术制备纳米SiO2/Ni复合镀层工艺的研究
成旦红,桑付明,袁蓉,曹铁华,徐伟一

作者

单位

摘要:

利用电沉积方法制备了纳米SiO2／Ni复合镀层。研究了阴极电流密度、微粒浓度、pH值、搅拌方式和表面活性剂种类以及浓度等对镀层沉积速率的影响，为正确制定电镀工艺提供了依据。扫描电镜观察表明，纳米微粒的加入增加了镀层表面的不工整性。

关键词: 电沉积复合镀层纳米材料纳米SiO2／N1

DOI：

分类号:TQ153

基金项目:

Study on the Preparation Technology of Electrodeposited Ni/Nano SiO2-Composite Coatings

CHENG Dan-hong SANG Fu-ming YUAN Rong CAO Tie-hua XU Wei-yi

Abstract:

A composite electro-deposited plating layer of nano -SiO2/Ni was prepared. The effects of cathodic current density, concentration of suspended nano-SiO2 powders, pH value, stirring style and concentration of surfactant agent on the deposition rate were studied. The result of SEM analysis showed that the surface of plating layer became more irregular than the surface of pure nickel plating.

Key words: electro-deposit,composite coating,nano material,nano-SiO2/Ni,